Thin-Film Standards

CAL-SIO2-50

Thin-film thickness standard is used to calibrate and verify the accuracy of Axometrics systems that are configured in reflection. The CAL-SIO2-50 is a 4" silicon wafer with 2 SEMI-standard flats with 50 nm (± 3.5 nm) of dry thermal oxide grown across the entire wafer. The certified area of the thin film thickness measurement is enclosed in a 10 mm x 20mm rectangular patterned region at the center of the wafer.